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DAVID JEFFREY DRUE

Overview
  • Total Patents
    24
About

DAVID JEFFREY DRUE has a total of 24 patent applications. Its first patent ever was published in 2007. It filed its patents most often in United States. Its main competitors in its focus markets machine tools, semiconductors and measurement are NIPPON SEIMITSU DENSHI CO LTD, CALITECH CO LTD and TIANJIN HWATSING TECH CO LTD.

Patent filings in countries

World map showing DAVID JEFFREY DRUEs patent filings in countries
# Country Total Patents
#1 United States 24

Patent filings per year

Chart showing DAVID JEFFREY DRUEs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 David Jeffrey Drue 24
#2 Lee Harry Q 14
#3 Benvegnu Dominic J 14
#4 Swedek Boguslaw A 10
#5 Hu Xiaoyuan 4
#6 Zhu Zhize 4
#7 Karuppiah Lakshmanan 3
#8 Qian Jun 3
#9 Tu Wen-Chiang 3
#10 Dhandapani Sivakumar 2

Latest patents

Publication Filing date Title
US2013052916A1 Optical detection of metal layer clearance
US2013288571A1 Feed forward and feed-back techniques for in-situ process control
US2013288570A1 Fitting of optical model with diffraction effects to measured spectrum
US2012278028A1 Generating model based spectra library for polishing
US2012276815A1 Varying optical coefficients to generate spectra for polishing control
US2012274932A1 Method of controlling polishing
US2012268738A1 Construction of reference spectra with variations in environmental effects
US2011318992A1 Adaptively tracking spectrum features for endpoint detection
US2011275167A1 Endpoint method using peak location of modified spectra
US2011256805A1 Adaptive tracking spectrum features for endpoint detection
US2011275281A1 Dynamically tracking spectrum features for endpoint detection
US2011301847A1 Automatic initiation of reference spectra library generation for optical monitoring
US2012196511A1 Gathering spectra from multiple optical heads
US2010217430A1 Spectrographic monitoring of a substrate during processing using index values
US2010130100A1 Using optical metrology for wafer to wafer feed back process control
US2010105288A1 Multiple libraries for spectrographic monitoring of zones of a substrate during processing
US2008138988A1 Detection of clearance of polysilicon residue