AXUS TECH LLC has a total of 15 patent applications. It increased the IP activity by 800.0%. Its first patent ever was published in 2017. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets machine tools, semiconductors and surface technology and coating are NIPPON SEIMITSU DENSHI CO LTD, HANGZHOU ZHONGGUI ELECTRONIC TECH CO LTD and DAITO ELECTRON CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 6 | |
#2 | WIPO (World Intellectual Property Organization) | 5 | |
#3 | China | 2 | |
#4 | EPO (European Patent Office) | 1 | |
#5 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Machine tools | |
#2 | Semiconductors | |
#3 | Surface technology and coating | |
#4 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Grinding or polishing devices | |
#2 | Semiconductor devices | |
#3 | Metallic material removal | |
#4 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Trojan Daniel Ray | 13 |
#2 | Shugrue John Kevin | 2 |
#3 | Ciszek Richard | 2 |
#4 | Trojan Daniel R | 2 |
#5 | Roberts Robert Clark | 2 |
#6 | Daniel Clifford | 2 |
Publication | Filing date | Title |
---|---|---|
WO2021025927A1 | Method and apparatus for insitu adjustment of wafer slip detection during work piece polishing | |
US2021005479A1 | Temperature controlled substrate carrier and polishing components | |
WO2019089467A1 | Planarized membrane and methods for substrate processing systems | |
KR20200002928A | CMP machine with improved throughput and process flexibility | |
WO2018175758A1 | Atmospheric plasma in wafer processing system optimization | |
US2017355062A1 | Chemical mechanical planarization carrier system |