| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 3 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | WIPO (World Intellectual Property Organization) | 3 | |
| #4 | United States | 2 | |
| #5 | Australia | 1 | |
| #6 | Canada | 1 | |
| #7 | EAPO (Eurasian Patent Organization) | 1 | |
| #8 | Hong Kong | 1 | |
| #9 | New Zealand | 1 | |
| #10 | South Africa | 1 |
| # | Industry | |
|---|---|---|
| #1 | Surface technology and coating | |
| #2 | Thermal processes | |
| #3 | Semiconductors | |
| #4 | Chemical engineering |
| # | Technology | |
|---|---|---|
| #1 | Furnaces | |
| #2 | Coating metallic material | |
| #3 | Single-crystal-growth | |
| #4 | Boiling machines | |
| #5 | Semiconductor devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Curatolo Susana | 13 |
| #2 | Wong Kai-Wai | 3 |
| #3 | Susana Curatolo | 3 |
| #4 | Curatolo Susanna | 1 |
| #5 | Kai-Wai Wong | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN101317279A | Method for operating a superconductor at a temperature higher than the superconductive temperature T | |
| US2004159647A1 | Melting and vaporizing apparatus and method | |
| US7067006B2 | OH and H resistant silicon material |