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LPE SPA

Overview
  • Total Patents
    155
  • GoodIP Patent Rank
    32,228
  • Filing trend
    ⇩ 93.0%
About

LPE SPA has a total of 155 patent applications. It decreased the IP activity by 93.0%. Its first patent ever was published in 1984. It filed its patents most often in WIPO (World Intellectual Property Organization), Italy and EPO (European Patent Office). Its main competitors in its focus markets surface technology and coating, semiconductors and machines are JIANGSU XINGTELIANG TECH CO LTD, IIJIMA YASUHIRO and CERMET INC.

Patent filings per year

Chart showing LPE SPAs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Preti Franco 111
#2 Ogliari Vincenzo 72
#3 Crippa Danilo 48
#4 Corea Francesco 32
#5 Pozzetti Vittorio 30
#6 Preti Silvio 27
#7 Valente Gianluca 25
#8 Speciale Natale 18
#9 Puglisi Marco 15
#10 Tarenzi Giuseppe 15

Latest patents

Publication Filing date Title
WO2021064651A1 Treating arrangement with loading/unloading group and epitaxial reactor
WO2021064653A1 Treating arrangement with storage chamber and epitaxial reactor
WO2021064650A1 Treating arrangement with transfer chamber and epitaxial reactor
WO2020084563A1 Deposition reactor with inductors and electromagnetic shields
WO2020128653A1 Reaction chamber for an epitaxial reactor of semiconductor material with non-uniform longitudinal section and reactor
IT201900000223A1 Reaction chamber with rotating element and reactor for the deposition of semiconductor material
IT201900000235A1 Reaction chamber for a deposition reactor with cavity and bottom sealing element and reactor
CN109983164A The heating means of reactor for epitaxial deposition and reactor for epitaxial deposition
CN109844175A The method of epitaxial deposition reactor and cooling susceptor and substrate with the reflector outside reaction chamber
CN108884589A The susceptor that clamps substrate by negative pressure and for the reactor of epitaxial deposition
CN108779576A Can sensing heating pedestal and epitaxial deposition reactor
CN107916450A Susceptor, reactor and working system for epitaxial deposition with asymmetric recess
CN106471614A For manipulating instrument, method of operating and the epitaxial reactor of substrate
US2016312382A1 Reaction chamber for epitaxial growth with a loading/unloading device and reactor
CN105814243A Susceptor with curved and concentric grooves on the substrates support
CN105705679A Susceptor with arched shape grooves on the substrates support surface
CN105637118A Coated susceptor and anti-bowing method
EP3049548A1 Susceptor with supporting element
WO2010119430A1 Reaction chamber of an epitaxial reactor and reactor that uses said chamber
EP2367964A1 Reaction chamber of an epitaxial reactor