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GLOSIL INC

Overview
  • Total Patents
    16
About

GLOSIL INC has a total of 16 patent applications. Its first patent ever was published in 2005. It filed its patents most often in Republic of Korea, China and Taiwan. Its main competitors in its focus markets surface technology and coating, environmental technology and semiconductors are GTAT IP HOLDING LLC, GT ADVANCED CZ LLC and FUKUDA CRYSTAL LAB.

Patent filings in countries

World map showing GLOSIL INCs patent filings in countries

Patent filings per year

Chart showing GLOSIL INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Gil Jong Won 6
#2 Kim Han Sung 6
#3 So Won Wook 4
#4 Moon Sang Jin 4
#5 Kim Min Soon 2
#6 Moon Sang-Jin 1
#7 Won-Wook So 1
#8 Jong-Won Gil 1
#9 Sang-On Moon 1
#10 Sung Kim Han 1

Latest patents

Publication Filing date Title
KR20130067601A Apparatus for manufacturing polycrystaline silicon ingot equipped a wing type open/close device
KR20130015880A Raw materials for the manufacture of single crystal silicon wafer manufacturing method polysilicon load
KR20120117240A Polycrystalline ingot growth equipment
KR20120066209A Apparatus for manufacturing poly crystaline silicon ingot for door open/close device having a wing type
KR20110032739A Apparatus for manufacturing poly crystaline silicon ingot for door open/close device having a rotatable
KR20100085546A The shielding apparatus for the plant cultivation whit solar cell
KR20090035337A Apparatus for manufacturing poly crystaline silicon ingot for solar battery having door open/close device using supporter
KR20090035336A Apparatus for manufacturing poly crystaline silicon ingot for solar battery having door open/close device using hinge
KR20080068423A Apparatus for manufacturing poly crystaline silicon ingot for solar battery
KR20080068424A Method for manufacturing poly crystaline silicon ingot for solar battery
KR100692248B1 The band sawing machine for cutting brittles material
KR20060127495A Cathode electrode of single crystal silicon having specified orientation and wafer etching system using it