| # | Country | Total Patents | |
|---|---|---|---|
| #1 | EPO (European Patent Office) | 4 | |
| #2 | Germany | 3 | |
| #3 | WIPO (World Intellectual Property Organization) | 3 | |
| #4 | United States | 2 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Audio-visual technology | |
| #3 | Computer technology | |
| #4 | Textiles and paper |
| # | Technology | |
|---|---|---|
| #1 | Optical systems | |
| #2 | Photomechanical semiconductor production | |
| #3 | Display controls | |
| #4 | Data recognition and presentation | |
| #5 | Typewriters |
| # | Name | Total Patents |
|---|---|---|
| #1 | Eggers Stefan | 12 |
| #2 | Andreae Claas | 10 |
| #3 | Straeter Hans-Dieter | 2 |
| Publication | Filing date | Title |
|---|---|---|
| DE19944760A1 | Device and method for compensating for inhomogeneities in imaging systems | |
| DE19944759A1 | Procedure for the synchronization of positioning and exposure processes | |
| DE19944761A1 | Device and method for wavelength-dependent light decoupling | |
| EP1141780A1 | An exposure device |