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ASM INT

Overview
  • Total Patents
    454
  • GoodIP Patent Rank
    171,700
About

ASM INT has a total of 454 patent applications. Its first patent ever was published in 1990. It filed its patents most often in United States, EPO (European Patent Office) and Taiwan. Its main competitors in its focus markets semiconductors, surface technology and coating and machines are ASM INC, F T L CO LTD and KOOKJE ELECTRIC KOREA CO LTD.

Patent filings per year

Chart showing ASM INTs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kuznetsov Vladimir Ivanovich 43
#2 Huussen Frank 38
#3 Granneman Ernst Hendrik August 37
#4 Hasper Albert 36
#5 Zinger Jan 32
#6 Granneman Ernst H A 32
#7 Haukka Suvi P 32
#8 Raaijmakers Ivo 30
#9 Snijders Gert-Jan 30
#10 Oosterlaken Theodorus Gerardus 28

Latest patents

Publication Filing date Title
US2015191817A1 Precursors and methods for atomic layer deposition of transition metal oxides
US2014322885A1 Method of making a resistive random access memory device
US2013183445A1 Enhanced thin film deposition
US2013196502A1 Selective formation of metallic films on metallic surfaces
TW201326448A Methods for forming doped silicon oxide thin films
KR20130030739A Nanolayer deposition process for composite films
TW201310566A Wafer processing apparatus with heated, rotating substrate support
TW201303062A Metal silicide, metal germanide, methods for making the same and nickel thin film deposition
CN102956529A Wafer boat package
EP2395546A2 Method for processing solar cell substrates in a vertical furnace
TW201546900A Method for selectively depositing film on substrate
CN102687243A Synthesis and use of precursors for ALD of Group VA element containing thin films
KR20120104552A Processes for passivating dielectric films
US2011020546A1 Low Temperature ALD of Noble Metals
US2010009080A1 Method for vaporizing non-gaseous precursor in a fluidized bed
US2009269939A1 Cyclical oxidation process
US2010216306A1 Protection of conductors from oxidation in deposition chambers
US2010200989A1 Liner materials and related processes for 3-D integration
US2010155859A1 Selective silicide process
KR20090068179A Process for producing a thin film comprising silicon dioxide