F T L CO LTD has a total of 22 patent applications. Its first patent ever was published in 1992. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets surface technology and coating, semiconductors and thermal processes are ASM INT, ASM MICROCHEMISTRY OY and ASM INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 9 | |
#2 | WIPO (World Intellectual Property Organization) | 6 | |
#3 | EPO (European Patent Office) | 2 | |
#4 | Taiwan | 2 | |
#5 | Australia | 1 | |
#6 | China | 1 | |
#7 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Surface technology and coating | |
#2 | Semiconductors | |
#3 | Thermal processes | |
#4 | Materials and metallurgy | |
#5 | Chemical engineering |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Coating metallic material | |
#3 | Single-crystal-growth | |
#4 | Furnaces | |
#5 | Details of furnaces | |
#6 | Cleaning | |
#7 | Treatment of glass |
# | Name | Total Patents |
---|---|---|
#1 | Takagi Mikio | 21 |
#2 | Satou Masayuki | 1 |
#3 | Jeong Woo-Cheol | 1 |
#4 | Takahashi Seiichi | 1 |
#5 | Inoue Hiroaki | 1 |
#6 | Miura Yutaka | 1 |
Publication | Filing date | Title |
---|---|---|
WO2007020926A1 | Method for surface treating semiconductor | |
WO2005122231A1 | Heating furnace for manufacturing semiconductor device and method for manufacturing semiconductor device | |
WO2005104202A1 | Method of cleaning substrate | |
US6204194B1 | Method and apparatus for producing a semiconductor device | |
CN1154571A | Method for producing semiconductor device and production apparatus of semiconductor device | |
US6159873A | Method for producing semiconductor device and production apparatus of semiconductor device | |
US5387557A | Method for manufacturing semiconductor devices using heat-treatment vertical reactor with temperature zones |