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GB0713773D0
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Plasma assisted sputter deposition.
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FR2880633A1
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Plasma-based cathodic spray deposition system
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JP2004266294A
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Method for forming insulating film
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JP2005340721A
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Method of depositing dielectric film having high dielectric constant
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JP2005327361A
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Vertical magnetic recording medium
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JP2005289556A
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Substrate carrying device
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JP2005226153A
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Plasma-assisted sputter deposition system
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JP2005274175A
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Capacitance type pressure sensor and its manufacturing method
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JP2004218844A
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Non-contact type magnetic induction feeding device
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JP2005268396A
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Vacuum treatment apparatus
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JP2005256105A
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Cvd system
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JP2005259606A
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Filament for thermal electron emission
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JP2005256112A
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Double shutter control method for multitarget sputtering deposition system
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JP2005256086A
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Physical vapor deposition apparatus for forming film
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JP2005235970A
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Wafer stage
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JP2005271085A
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Method of integrating mems and ic on substrate, and mems device
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JP2005207275A
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Vacuum pump and substrate processing device with the same
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JP2005203209A
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Gas activation device
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US2004129947A1
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Capacitive pressure sensor
|
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JP2004212388A
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Electrostatic capacity pressure sensor
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