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And corp

Overview
  • Total Patents
    20
  • GoodIP Patent Rank
    211,121
About

And corp has a total of 20 patent applications. Its first patent ever was published in 2008. It filed its patents most often in Republic of Korea and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, optics and measurement are ITO YOSHITAKE, NANJING JINGQU INTEGRATED CIRCUIT CO LTD and CSMC TECH CORP.

Patent filings in countries

World map showing And corps patent filings in countries

Patent filings per year

Chart showing And corps patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Rhee Tae Pok 5
#2 Kim Jea Dal 4
#3 Park Ji Ho 3
#4 Baek Jeom Gon 2
#5 Han Gap Su 2
#6 Kim Jae Dal 2
#7 Cho Min Su 2
#8 Cheon Ok Soon 2
#9 Park Woo Hyun 2
#10 Kim Gi Deok 2

Latest patents

Publication Filing date Title
KR20160095233A Nano imprint apparatus improved life of mold
KR20160095232A Mold removal apparatus for nano imprint
KR20150144936A Method for forming surface patterns of sapphire substrate
KR20140088717A Method for forming surface patterns of sapphire substrate
KR20140065136A Method for forming surface patterns of sapphire substrate
KR101371611B1 Photomask pattern layout method for forming 3-dimensional surface pattern of sapphire substrate, and photomask using the same
KR20140046551A Method for forming surface patterns of sapphire substrate
KR20130051138A Loading device for high pressure processing unit
KR20120024213A Chamber system capable of continuous process
WO2011052866A1 Non-invasive flow meter, and dispensing system including same
KR20110067206A Ultraviolet sterilizer of a toilet stool
KR20100103120A Treating apparatus using high-pressure treating device and recycle method for the high-pressure treating device
KR20100103123A High-pressure treating device and high-pressure sealing method
KR20100001010A Treatment apparatus for substrate and method thereof
KR20090110630A Substrate treating apparatus for detecting impact applied on substrate and the method thereof, impact detecting apparatus
KR20090110632A Substrate treating apparatus having two fluid nozzle
KR20090090780A Dilution treatment apparatus of flammability wastewater produced in the manufacturing process of the silicon wafer and the method thereof