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ZETETIC INST

Overview
  • Total Patents
    125
About

ZETETIC INST has a total of 125 patent applications. Its first patent ever was published in 1995. It filed its patents most often in United States, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets measurement, optics and audio-visual technology are DOWNS MICHAEL JOHN, SUZHOU H&L INSTR LLC and METRON SYSTEMS INC.

Patent filings per year

Chart showing ZETETIC INSTs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hill Henry Allen 72
#2 Hill Henry A 49
#3 Hamann Steven 4
#4 Ferrio Kyle B 3
#5 Fischer David A 3
#6 Hill H A 2
#7 Ziebell Douglas A 1
#8 Shifflett Peter 1
#9 Oglesby Paul H 1
#10 Womack Gary L 1

Latest patents

Publication Filing date Title
US2008030742A1 Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase shifting point-diffraction interferometry
US2007121115A1 Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
EP1917496A2 Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
TW200706831A Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
US2007014319A1 Continuously Tunable External Cavity Diode Laser Sources With High Tuning And Switching Rates And Extended Tuning Ranges
EP1883783A2 Apparatus and method for in situ and ex situ measurements of optical system flare
WO2007008265A2 Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
WO2006034065A2 Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces
US2006033924A1 Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
TW200538704A Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry
US2005254063A1 Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks
US2005206909A1 Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
WO2005031397A2 Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
US2005111006A1 Apparatus and method for ellipsometric measurements with high spatial resolution
WO2004090466A2 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry
EP1608934A2 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
US2004201854A1 Longitudinal differential interferometric confocal microscopy
US2004201853A1 Transverse differential interferometric confocal microscopy
US2004257577A1 Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry
US2004246486A1 Interferometric confocal microscopy incorporating a pinhole array beam-splitter