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NANO SYSTEM SOLUTIONS KK

Overview
  • Total Patents
    21
About

NANO SYSTEM SOLUTIONS KK has a total of 21 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Japan and Taiwan. Its main competitors in its focus markets measurement and optics are HUMEN CO LTD, GASERA LTD and SUZHOU H&L INSTR LLC.

Patent filings in countries

World map showing NANO SYSTEM SOLUTIONS KKs patent filings in countries
# Country Total Patents
#1 Japan 19
#2 Taiwan 2

Patent filings per year

Chart showing NANO SYSTEM SOLUTIONS KKs patent filings per year from 1900 to 2020

Focus industries

# Industry
#1 Measurement
#2 Optics

Top inventors

# Name Total Patents
#1 Sakai Motoyuki 11
#2 Haga Kazumi 7
#3 Yokoyama Hiroshi 3
#4 Kimura Kazuhiko 3
#5 Ushiyama Zenta 2
#6 Sakai Motoshi 2
#7 Wada Eizo 2
#8 Matsumoto Hidehiko 1
#9 Kino Satoru 1

Latest patents

Publication Filing date Title
JP2011142216A Wafer edge and wafer reverse surface processing device
JP2011142215A Wafer processing device
JP2008112093A Exposure method and exposure apparatus
JP2008028099A Device and method for exposure
JP2007317862A Aligner and exposure method
JP2007285876A Spherical surface inspection method and apparatus
JP2007114087A Surface inspection method
JP2007047010A Wafer periphery inspection method
JP2007036039A Exposure pattern formation method
JP2007036038A Automatic optical axis correction method of telecentric optical system, automatic optical axis correction telecentric optical device, and exposing device
JP2007024623A Surface inspection device and surface inspection method
JP2007027188A Forming method of exposure lighting light source, exposure lighting light source apparatus, and exposure method and apparatus
JP2007024528A Wafer outer circumference inspection device
JP2007017181A Device and method for inspecting surface
JP2007019079A Exposure apparatus
JP2007019076A Exposure apparatus and exposure method
JP2007019073A Exposure pattern forming apparatus and exposure apparatus
JP2006313202A Method for manufacturing mask
JP2006269802A Large area maskless exposure method and exposure apparatus