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CN111635314A
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Degradable photoresist resin monomer synthesized from isopropyl dimethyl hexahydronaphthalene diketone and synthesis method thereof
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CN111763147A
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Degradable photoresist resin monomer synthesized from methylhexahydronaphthalene dione and synthesis method thereof
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CN111777579A
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Degradable photoresist resin monomer synthesized from furandione and synthesis method thereof
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CN111606806A
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Degradable photoresist resin monomer synthesized from dimethyl bicyclo [3.3.1] nonane diketone and synthesis method thereof
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CN111662267A
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Photoresist acid-producing resin monomer containing dioxobicyclo [2.2.2] octane dicarboxylic acid ester structure and preparation method thereof
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CN111777583A
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Degradable photoresist resin monomer synthesized from pyran-3, 5-dione and synthesis method thereof
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CN111777587A
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Degradable photoresist resin monomer synthesized from oxaspiro [4.5] decanedione and synthesis method thereof
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CN111689862A
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Degradable photoresist resin monomer synthesized from 10-O-acetyl iso-calamus diol and synthesis method thereof
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CN111875500A
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Photosensitive photoresist resin monomer containing polycyclic beta-ketone structure and synthetic method thereof
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CN111763160A
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Trifluoro sulfonamide adamantane photoresist resin monomer and preparation method thereof
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CN111675616A
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Degradable photoresist resin monomer synthesized from epoxy alisma alkene and synthesis method thereof
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CN111689931A
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Trifluoro sulfonamide furan type photoresist resin monomer and preparation method thereof
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CN111675680A
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Trifluoro sulfonamide pyran type photoresist resin monomer and preparation method thereof
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CN111704563A
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Trifluorosulfonamide hexahydroindan photoresist resin monomer and preparation method thereof
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CN111747966A
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Trifluoro sulfonamide 2-oxabicyclo [2.2.1] heptane photoresist resin monomer and preparation method thereof
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CN111689941A
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Trifluoro sulfonamide 1, 4-dioxospiro [4,5] decane photoresist resin monomer and preparation method thereof
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CN111675720A
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Trifluoro sulfonamide hexahydrofuro [3,2-b ] furan photoresist resin monomer and preparation method thereof
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CN111777532A
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Triflurosulfonamide cycloheptane photoresist resin monomer and preparation method thereof
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CN111635341A
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Trifluoro sulfonamide octahydro-pentalene photoresist resin monomer and preparation method thereof
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CN111704601A
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Degradable photoresist acid-producing resin monomer synthesized from 3, 5-dihydroxycyclohexanone and preparation method thereof
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