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SHANGHAI BNCSCITECH CO LTD

Overview
  • Total Patents
    15
  • GoodIP Patent Rank
    115,412
About

SHANGHAI BNCSCITECH CO LTD has a total of 15 patent applications. Its first patent ever was published in 2019. It filed its patents most often in China. Its main competitors in its focus markets organic fine chemistry, optics and macromolecular chemistry and polymers are SHANGHAI BODONG CHEMICAL TECH CO LTD, XUZHOU B&C CHEMICAL CO LTD and LAMBSON FINE CHEMICALS LIMITED.

Patent filings in countries

World map showing SHANGHAI BNCSCITECH CO LTDs patent filings in countries
# Country Total Patents
#1 China 15

Patent filings per year

Chart showing SHANGHAI BNCSCITECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Jiang Xiaohui 12
#2 Li Manman 11
#3 Pan Huiying 10
#4 Guo Ying 10
#5 Yu Zhenlin 9
#6 Bi Jingfeng 8
#7 He Baoyuan 5
#8 Wang Yinzhuo 4

Latest patents

Publication Filing date Title
CN111138407A Sulfonium sulfonate photo-acid generator synthesized from trumpet-shaped tea alcohol and synthesis method thereof
CN111116605A Photoresist resin monomer synthesized from aldopentose and synthesis method thereof
CN111138406A Sulfonium sulfonate photo-acid generator synthesized from guaiol and synthesis method thereof
CN111116546A Sulfonium sulfonate photo-acid generator synthesized from beta-eucalyptol and synthesis method thereof
CN111138410A Acid-producing resin monomer for photoresist containing adamantane structure and synthetic method thereof
CN111100007A Photoresist resin monomer synthesized from carboxylic acid compound and synthesis method thereof
CN111138408A Sulfonium sulfonate photo-acid generator synthesized from cedrol and synthesis method thereof
CN111138405A Sulfonium sulfonate photo-acid generator synthesized from patchouli alcohol and synthesis method thereof
CN111138288A Photoresist resin monomer containing five-membered ring β -ketone structure and synthetic method thereof
CN111138287A Photoresist resin monomer synthesized from hexahydro-1H-indene-1, 3(2H) -diketone and synthetic method thereof
CN111138281A Photoresist resin monomer and synthetic method thereof
CN111116426A Sulfonium salt photo-acid generator containing patchouli alcohol structure and preparation method thereof
CN111138331A Sulfonium salt photo-acid generator containing β -eucalyptol structure and preparation method thereof
CN111123645A Sulfonium salt photo-acid generator containing cedrol structure and preparation method thereof
CN111138280A Photoresist resin monomer synthesized from 3-ethylbicyclo [3.3.1] nonane-2, 4-diketone and synthesis method thereof