YAMAGUCHI SHUHEI has a total of 12 patent applications. Its first patent ever was published in 2008. It filed its patents most often in United States. Its main competitors in its focus markets optics, organic fine chemistry and macromolecular chemistry and polymers are CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO LTD, ECHIGO MASATOSHI and MURATA KIYOSHI.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 12 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Organic fine chemistry | |
#3 | Macromolecular chemistry and polymers | |
#4 | Machines | |
#5 | Measurement | |
#6 | Basic materials chemistry | |
#7 | Pharmaceuticals |
# | Name | Total Patents |
---|---|---|
#1 | Yamaguchi Shuhei | 12 |
#2 | Shibuya Akinori | 4 |
#3 | Yoshida Yuko | 1 |
#4 | Iizuka Yusuke | 1 |
#5 | Tada Yuko | 1 |
#6 | Wakayama Toshiyuki | 1 |
#7 | Tomeba Hisamitsu | 1 |
#8 | Shirakawa Michihiro | 1 |
#9 | Kataoka Shohei | 1 |
#10 | Fujita Mitsuhiro | 1 |
Publication | Filing date | Title |
---|---|---|
US2012237874A1 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | |
US2010255418A1 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith | |
US2010183980A1 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | |
US2009246695A1 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound |