VISITECH AS has a total of 22 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Taiwan, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets optics, machines and semiconductors are ZHONGSHAN AISCENT TECH CO LTD, ROLITH INC and MACDERMID GRAPHICS SOLUTIONS LLC.
# | Country | Total Patents | |
---|---|---|---|
#1 | Taiwan | 5 | |
#2 | WIPO (World Intellectual Property Organization) | 5 | |
#3 | EPO (European Patent Office) | 4 | |
#4 | Norway | 4 | |
#5 | Serbia | 2 | |
#6 | Republic of Korea | 1 | |
#7 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Machines | |
#3 | Semiconductors | |
#4 | Audio-visual technology |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Shaping of plastics | |
#3 | Additive manufacturing | |
#4 | Semiconductor devices | |
#5 | Television | |
#6 | Cameras |
# | Name | Total Patents |
---|---|---|
#1 | Kirkhorn Endre | 20 |
#2 | Jørgensen Trond | 14 |
#3 | Tafjord Øyvind | 8 |
#4 | Daae John | 7 |
#5 | Jorgensen Trond | 5 |
#6 | Tafjord Oyvind | 3 |
#7 | Almedal Roy | 3 |
#8 | Jorgensen Trond A | 1 |
#9 | Langlo Ola Bard | 1 |
Publication | Filing date | Title |
---|---|---|
NO20190876A1 | Real time Registration Lithography system | |
NO20190617A1 | System and method for exposing a material with images | |
RS61342B1 | Method for exposing a photo polymerizable material for solidification of material layer by layer to build a 3d object | |
EP3040779A1 | A maskless exposure apparatus with alignment | |
EP3040778A1 | Method for providing uniform brightness from a light projector on an image area. | |
EP2312390A1 | Light source comprising a digital regulator | |
US2005007785A1 | Light source device for illuminating microdisplay devices |