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VACUUM METALLURG CO LTD

Overview
  • Total Patents
    118
About

VACUUM METALLURG CO LTD has a total of 118 patent applications. Its first patent ever was published in 1991. It filed its patents most often in Japan, United States and Germany. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are ROBINSON MATTHEW R, HASHIMOTO KASEI KOGYO KK and ASM GENITECH KOREA LTD.

Patent filings in countries

World map showing VACUUM METALLURG CO LTDs patent filings in countries
# Country Total Patents
#1 Japan 102
#2 United States 12
#3 Germany 2
#4 China 1
#5 Taiwan 1

Patent filings per year

Chart showing VACUUM METALLURG CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hayashi Chikara 20
#2 Oda Masaaki 19
#3 Kodera Masahiro 13
#4 Fuchida Hidetsugu 12
#5 Nozawa Yoshiharu 11
#6 Kin Yutaka 9
#7 Setoguchi Kazuhiro 8
#8 Oba Akira 8
#9 Takahashi Kazuhisa 7
#10 Nakadai Yasuo 7

Latest patents

Publication Filing date Title
JP2004243155A Method for washing shower plate for film making device
JP2004119764A Method for evaluating semiconductor circuit and device for evaluating same
JP2003342712A Parts for film deposition apparatus and vacuum film deposition apparatus
JP2003253425A Method for depositing thin film by sputtering
JP2003073819A Target of tin - antimony oxide sintered compact, and manufacturing method therefor
JP2003073810A Thin-film aluminum alloy and sputtering target for forming thin-film aluminum alloy
JP2003013109A Tray for sintering electronic component
JP2002275561A Gold or gold-alloy material for thin film deposition and its manufacturing method, and hearth ingot using the gold or gold alloy and its manufacturing method
JP2002256422A W-Ti TARGET AND MANUFACTURING METHOD THEREFOR
JP2002256427A Assembly of titanium target for sputtering, and manufacturing method therefor
JP2002231720A Fine line forming method and equipment therefor
JP2002219587A Producing method for metal micro projection and producing device therefor
JP2002180239A Method of depositing metallic black nanoparticle film by jet printing method and the metallic black nanoparticle film obtained
JP2002105618A Surface structure for vacuum treatment chamber
JP2001271159A Conductive thin film deposition material
JP2001271162A Backing plate and sputtering target assembly
JP2001262331A Method for producing solid phase diffusion-joined sputtering target assembly
JP2001262330A Diffusion-joined sputtering target assembly and its producing method
JP2001262329A Solid phase diffusion-joined sputtering target assembly and its producing method
JP2001254185A Method of depositing electrically conductive metallic thin film and electrically conductive metallic hyperfine particle-dispersed material used for the method