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UNITED SILICON INC

Overview
  • Total Patents
    57
About

UNITED SILICON INC has a total of 57 patent applications. Its first patent ever was published in 1998. It filed its patents most often in United States and Taiwan. Its main competitors in its focus markets semiconductors, machines and surface technology and coating are CHONGQING KANGJIA OPTOELECTRONIC TECH RESEARCH INSTITUTE CO LTD, SAN AN OPTOELECTRONICS CO LTD and SUZHOU NANOJOIN PHOTONICS CO LTD.

Patent filings in countries

World map showing UNITED SILICON INCs patent filings in countries
# Country Total Patents
#1 United States 52
#2 Taiwan 5

Patent filings per year

Chart showing UNITED SILICON INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Liao Kuan-Yang 19
#2 Lee Tong-Hsin 10
#3 Lan Shih-Ming 6
#4 Hsiao Hsi-Mao 4
#5 Chen Chun-Lung 4
#6 Yu Tang 4
#7 Chen Eddie 3
#8 Meng Hsien-Liang 3
#9 Han Tsung-Hsien 2
#10 Lin Hsi-Chin 2

Latest patents

Publication Filing date Title
US6169017B1 Method to increase contact area
US6127228A Method of forming buried bit line
US6133091A Method of fabricating a lower electrode of capacitor
US6214741B1 Method of fabricating a bit line of flash memory
US6093600A Method of fabricating a dynamic random-access memory device
US6200886B1 Fabricating process for polysilicon gate
US6150237A Method of fabricating STI
US6191029B1 Damascene process
US6069032A Salicide process
US6194279B1 Fabrication method for gate spacer
TW402744B Manufacturing process of metal silicide
US6162731A Method of defining a conductive layer
US6091339A Position detector for a spin-drying machine used in integrated circuit fabrication
US5994197A Method for manufacturing dynamic random access memory capable of increasing the storage capacity of the capacitor
US6204147B1 Method of manufacturing shallow trench isolation
US6213444B1 Vibration damper
US6153528A Method of fabricating a dual damascene structure
US6099902A Method of determining a time to clean a low pressure chemical vapor deposition (LPCVD) system
TW382788B Method for producing metal interconnect
TW379447B Method of manufacturing DRAM cylindrical capacitor