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TOKYO CATHODE LAB

Overview
  • Total Patents
    167
About

TOKYO CATHODE LAB has a total of 167 patent applications. Its first patent ever was published in 1975. It filed its patents most often in Japan, Republic of Korea and Taiwan. Its main competitors in its focus markets measurement, audio-visual technology and electrical machinery and energy are APPLIED MATERIALS GMBH, ASIA ELECTRONICS INC and WUHAN JINGYITONG ELECTRONIC TECH CO LTD.

Patent filings in countries

World map showing TOKYO CATHODE LABs patent filings in countries

Patent filings per year

Chart showing TOKYO CATHODE LABs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tawa Yasunobu 25
#2 Takagi Hiroyuki 18
#3 Kato Mamoru 13
#4 Takizawa Hiroyuki 13
#5 Itagaki Takao 12
#6 Takeuchi Osamu 11
#7 Kiyota Noriyasu 11
#8 Yajima Teruo 11
#9 Fuchiyama Masaki 10
#10 Kai Junjiro 10

Latest patents

Publication Filing date Title
JP2013250145A Probe card
JP2013250142A Probe card
JP2013167503A Probe card and manufacturing method thereof
JP2012125879A Multiwire electric discharge machining apparatus and method for manufacturing silicon carbide plate using the same
JP2012125880A Multiwire electric discharge machining apparatus and method for manufacturing silicon carbide plate using the same
JP2012061550A Multi-wire electrical discharge machining device, multi-wire electrical discharge machining method, and method of manufacturing silicon carbide plate
JP2011183477A Multi-wire electric discharge machining device and method for manufacturing silicon carbide plate
JP2011140088A Multi-wire electrical discharge machining device
JP2011062764A Wire electric discharge machining device
JP2011058880A Spring pin and probe card using the same
JP2010284765A Electric discharge wire machining device
JP2010207988A Wire electric discharge machining device
JP2010203890A Probe card and method for manufacturing the same
JP2010044304A Inspection method for substrate having protective film
JP2010042922A Device and system for peeling protecting film
JP2010038868A Optical viscosity measuring system
JP2008281576A Conductive pattern inspection device
JP2009156676A Substrate inspecting apparatus
JP2009085895A Overcurrent protection circuit and probe device
JP2009046324A Production method of porous silicon