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TECH SEMICONDUCTOR SINGAPORE

Overview
  • Total Patents
    32
About

TECH SEMICONDUCTOR SINGAPORE has a total of 32 patent applications. Its first patent ever was published in 2001. It filed its patents most often in Singapore and United States. Its main competitors in its focus markets control, semiconductors and environmental technology are FUNK MERRITT, PANNESE PATRICK D and ISEMICON INC.

Patent filings in countries

World map showing TECH SEMICONDUCTOR SINGAPOREs patent filings in countries
# Country Total Patents
#1 Singapore 17
#2 United States 15

Patent filings per year

Chart showing TECH SEMICONDUCTOR SINGAPOREs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Phang Yew Hoong 6
#2 Jumahri Nurulhuda Binte 4
#3 Datta Devesh Kumar 4
#4 Chang Jianguang 4
#5 Lim Khoon Peng 3
#6 Peng Lim Khoon 3
#7 Zhou Ping 2
#8 Sim Boon Hong 2
#9 Krishnan Subramanian 2
#10 Maskara Ashish 2

Latest patents

Publication Filing date Title
US2011201185A1 Method to improve transistor performance matching for plasma-assisted source/drain formation
US2010241250A1 Feedback and feedforward control of a semiconductor process without output values from upstream processes
US2009249880A1 Real-time detection of wafer shift/slide in a chamber
US2008201003A1 Method and system for reticle scheduling
US2008195241A1 Method and system for wafer lot order
US2008177399A1 Method of process trend matching for identification of process variable
US2008124814A1 Method for passivation of plasma etch defects in DRAM devices
US2007142951A1 Method to identify machines causing excursion in semiconductor manufacturing
US2007067117A1 Real time monitoring of particulate contamination in a wafer processing chamber
US2006172662A1 Real time monitoring of CMP pad conditioning process
US2006106921A1 Method for data collection during manufacturing processes
US2006046621A1 Retaining ring structure for edge control during chemical-mechanical polishing
US2005282366A1 Method for monitoring ion implant doses
US2004119145A1 Method for depositing a very high phosphorus doped silicon oxide film