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TASMIT INC

Overview
  • Total Patents
    33
  • GoodIP Patent Rank
    46,569
About

TASMIT INC has a total of 33 patent applications. Its first patent ever was published in 2018. It filed its patents most often in Japan, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets measurement, computer technology and electrical machinery and energy are IMABIOTECH, APPLIED MATERIALS ISRAEL LTD and SIDEC TECHNOLOGIES AB.

Patent filings in countries

World map showing TASMIT INCs patent filings in countries
# Country Total Patents
#1 Japan 13
#2 United States 6
#3 WIPO (World Intellectual Property Organization) 5
#4 Republic of Korea 4
#5 Taiwan 4
#6 China 1

Patent filings per year

Chart showing TASMIT INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Haga Tsugihiko 6
#2 Arai Yoichi 4
#3 Tanaka Kazuto 4
#4 Nakazawa Shinichi 4
#5 Maruyama Kotaro 3
#6 Miura Yuji 3
#7 Oya Masahiro 3
#8 Mori Taihei 2
#9 Shigeta Takashi 2
#10 Kato Makoto 2

Latest patents

Publication Filing date Title
WO2020121739A1 Image-matching method, and computation system for executing image-matching process
JP2020161769A Image generation method
JP2020154977A Pattern matching method
JP2020155598A Electrostatic chuck
JP2020150107A Semiconductor pattern measurement processing apparatus
JP2020145330A Image generating apparatus
JP2020144995A Method of removing image distortion
JP2020136231A Semiconductor inspection apparatus
JP2020136623A Electrostatic chuck
JP2020123521A Stage moving system
JP2020123034A Image matching support method, image matching support device, and computer readable recording medium having program for causing computer to execute image matching support method recorded therein
JP2020123064A Image matching determination method, image matching determination device, and computer-readable recording medium capable of recording programs for causing computers to execute image matching determination method
JP2020119665A Scanning electron microscope
JP2020067779A Method for detecting defect of pattern formed in wafer