| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Taiwan | 8 | |
| #2 | China | 7 | |
| #3 | EPO (European Patent Office) | 7 | |
| #4 | Japan | 6 | |
| #5 | Republic of Korea | 6 | |
| #6 | WIPO (World Intellectual Property Organization) | 4 | |
| #7 | Australia | 2 | |
| #8 | United States | 2 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Surface technology and coating | |
| #3 | Mechanical elements |
| # | Technology | |
|---|---|---|
| #1 | Coating metallic material | |
| #2 | Electric discharge tubes | |
| #3 | Lighting device details | |
| #4 | Venting or aerating devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Stowell Michael W | 17 |
| #2 | Newcomb Richard | 8 |
| #3 | Robinson Doug | 4 |
| #4 | Geisler Michael | 4 |
| #5 | Stowell Michael W Jr | 4 |
| #6 | Chapin John S | 3 |
| #7 | Elliott Stephen M | 3 |
| #8 | O'Keefe Patrick L | 3 |
| #9 | Petrach Philip M | 2 |
| #10 | Dieguez-Campo Jose Manuel | 2 |
| Publication | Filing date | Title |
|---|---|---|
| KR20070047216A | System and method for modulation of power and power related functions of pecvd discharge sources to achieve new film properties | |
| EP1731806A1 | Dual gate isolating valve | |
| EP1650321A2 | A sputtering system | |
| EP1584707A1 | Power coupling for high-power sputtering | |
| US7513141B2 | Method for differentially pumping endblock seal cavity | |
| US2004026235A1 | System and apparatus for control of sputter deposition process | |
| WO9842890A1 | Magnesium oxide sputtering apparatus |