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SMIC SHANGHAI CO LTD

Overview
  • Total Patents
    43
About

SMIC SHANGHAI CO LTD has a total of 43 patent applications. Its first patent ever was published in 2012. It filed its patents most often in China. Its main competitors in its focus markets semiconductors, electrical machinery and energy and optics are PSK HOLDINGS INC, ADVANCED PHOTONIX INC and NONOMURA MASARU.

Patent filings in countries

World map showing SMIC SHANGHAI CO LTDs patent filings in countries
# Country Total Patents
#1 China 43

Patent filings per year

Chart showing SMIC SHANGHAI CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Zhang Chenglong 4
#2 Li Shaobin 4
#3 Qiu Shengfen 3
#4 He Qiyang 3
#5 Li Fenglian 3
#6 Zhang Haiyang 3
#7 Zhou Ming 3
#8 Zhao Meng 3
#9 Shang Fei 2
#10 Sui Yunqi 2

Latest patents

Publication Filing date Title
CN104157556A Metal hard mask opening etching method
CN104157603A Method for enhancing combination strength of metal copper and NDC interface
CN104157570A High-voltage transistor and preparation method thereof
CN104157571A Preparation method of LDNMOS tube
CN104157564A Method for improving critical dimension uniformity after etching
CN104157615A Preparation method for flash memory
CN104157558A Flash memory gate structure, preparation method and application
CN104157593A Dust detection system and dust detection method
CN104155156A Preparation method of TEM plane sample
CN104152867A APCVD furnace tube recover maintenance method
CN104157559A Manufacture method of control gate and manufacture method of floating gate
CN104157614A Manufacture method for separated grid type flash memory
CN104158534A Voltage reduction conversion circuit for I/O interface
CN104157549A Cleaning method after CMP
CN104051340A Transistor manufacturing method using stress proximity technology
CN104051247A Process for removing TiN surface interface layer in high K metal gate process
CN104051417A Electric fuse structure and forming method thereof
CN104051324A Forming method of metal interconnection structure
CN104051258A Photoresist removing method applied to gate last process
CN104051248A Grid forming method