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DE102019213591A1
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TREATMENT PLANT AND PLASMA TREATMENT PROCESS
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Device and method for producing semiconductor wafers with a porous side
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Substrate coating method
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Method and device for providing steam
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Continuous flow system and method for coating substrates
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Method and apparatus for cleaning etched surfaces of a semiconductor substrate
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Method and apparatus for treating etched surfaces of a semiconductor substrate using ozone-containing medium
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Vacuum lock and method for sluicing a substrate carrier
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A method and apparatus for texturing a surface of a multicrystalline diamond wire sawn silicon substrate using ozone containing medium
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System and method for gas phase deposition
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illuminant
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Carrier cassette and carrier cassette stack
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Process and device for the thermal treatment of coated substrates, in particular of thin-film solar substrates
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Apparatus and method for treating substrates using a porous material support roll
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System and method for gas phase deposition
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Continuous system
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Cassette for holding plate-shaped elements
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Device and method for a cyclic continuous-flow system
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Cooling magazine for cooling substrates, device with a cooling magazine and method for treating substrates with such a device
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