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ULTECH CO LTD

Overview
  • Total Patents
    56
  • GoodIP Patent Rank
    99,318
  • Filing trend
    ⇧ 50.0%
About

ULTECH CO LTD has a total of 56 patent applications. It increased the IP activity by 50.0%. Its first patent ever was published in 1998. It filed its patents most often in Republic of Korea, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets semiconductors, surface technology and coating and electrical machinery and energy are INOCT CO LTD, ULVAC INC and SNTEK CO LTD.

Patent filings in countries

World map showing ULTECH CO LTDs patent filings in countries

Patent filings per year

Chart showing ULTECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Suk Chang Gil 30
#2 Kim Jun Tae 20
#3 Park Tae Gyu 11
#4 Seo Kyu Chul 9
#5 Kong Dae Young 9
#6 Kong Daeyoung 8
#7 Kang Chang Hoon 8
#8 Seog Changgil 8
#9 Yun Sung Ho 7
#10 Song Mun Gyu 7

Latest patents

Publication Filing date Title
KR102108141B1 The perovskite solar cell and method for fabricating the same
KR20200062578A Effusion cell for a vacuum evaporation
KR20200061527A Vacuum Deposition Device
KR20190096540A Atomic layer deposition system
KR20190048412A Atomic layer deposition system
KR20180128276A physical vapor deposition apparatus
KR101847530B1 plasma processing apparatus
KR20180011968A physical vapor deposition apparatus
KR20170062791A Magnetron sputtering source magnetic assembly
KR101605079B1 Rapid thermal processing apparatus
WO2016098923A1 Sputtering magnetron
KR20160071848A water leakage sensing structure for electron beam evaporator
KR101546320B1 apparatus for firing substrates
KR101382631B1 Texturing method for solar cell substrate and the solar cell substrate using the method
KR20120105219A Sputtering magnetron
KR20120033502A Vacuum evaporation apparatus
KR20110109216A Pecvd showerhead with inductively coupled plasma source
KR20110027909A Sputtering magnetron with rotary cylinderical mangnet array
KR20110000861A Plasma aided low pressure chemical vapor deposition appratus
KR20100048326A Plasma processing apparatus including multi-stacked dielecric window for uniform plasma density