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SHANGHAI HUALI INTEGRATED CIRCUIT MFG CO LTD

Overview
  • Total Patents
    738
  • GoodIP Patent Rank
    2,083
About

SHANGHAI HUALI INTEGRATED CIRCUIT MFG CO LTD has a total of 738 patent applications. Its first patent ever was published in 2018. It filed its patents most often in China and United States. Its main competitors in its focus markets semiconductors, optics and computer technology are SHANGHAI HUALI MICROELECT CORP, CSMC TECHNOLOGIES CORP and DONGBU ELECTRONICS CO LTD.

Patent filings in countries

World map showing SHANGHAI HUALI INTEGRATED CIRCUIT MFG CO LTDs patent filings in countries
# Country Total Patents
#1 China 724
#2 United States 14

Patent filings per year

Chart showing SHANGHAI HUALI INTEGRATED CIRCUIT MFG CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hu Zhanyuan 61
#2 Yu Shirui 43
#3 Chen Jianxun 23
#4 Liu Jueyang 22
#5 Huang Zhisen 20
#6 Li Zhonghua 19
#7 Li Zhenquan 18
#8 Gong Changhong 17
#9 Tian Ming 16
#10 Liu Liyao 16

Latest patents

Publication Filing date Title
CN112255896A Multiple pattern hot spot optimization method
CN112258502A Method for detecting defects of metal layer in layout
CN112255885A Photoresist coating method and coating device
CN112289681A Method for removing amorphous silicon layer in groove
CN112289747A Method for manufacturing high dielectric constant metal gate
CN112289740A Method for manufacturing through hole
CN112230524A System for adjusting pre-alignment height before wafer exposure and using method thereof
CN112232578A Photoetching machine efficiency evaluation system based on key index algorithm and application method thereof
CN112271161A Method for improving Fin size of Fin type transistor
CN112259503A Dual damascene process
CN112230515A Method for optimizing photoetching focus
CN112230516A Method for improving line width measurement accuracy of photoresist pattern
CN112230511A Method for removing contamination particles on surface of photomask protective film
CN112259452A Control method of plasma dry etching process
CN112259469A Semiconductor device critical dimension measuring method and method for obtaining SEM image
CN112259504A Method for manufacturing metal grid
CN112259474A Plasma source assembly for integrated circuit processing equipment
CN112259505A Method for forming fin body of semiconductor device
CN112259448A Ion implantation method after grid formation
CN112259443A Wet cleaning method for wafer