SENSYS INSTR CORP has a total of 27 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets measurement, machine tools and semiconductors are THERMA WAVE INC, SHANGHAI STAL PREC STAINLESS STEEL CO LTD and J & M ANALYTISCHE MESS & REGELTECHNIK GMBH.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 10 | |
#2 | WIPO (World Intellectual Property Organization) | 8 | |
#3 | Australia | 7 | |
#4 | EPO (European Patent Office) | 1 | |
#5 | Taiwan | 1 |
# | Industry | |
---|---|---|
#1 | Measurement | |
#2 | Machine tools | |
#3 | Semiconductors | |
#4 | Optics |
# | Name | Total Patents |
---|---|---|
#1 | Stanke Fred E | 26 |
#2 | Pham Hung | 9 |
#3 | Weber-Grabau Michael | 9 |
#4 | Tong Edric H | 9 |
#5 | Norton Adam E | 9 |
#6 | Johnson Kenneth C | 8 |
#7 | Ruth Douglas E | 6 |
#8 | Cahill James M Jr | 5 |
#9 | Hyatt Badru D | 3 |
#10 | Anguelov Ivelin A | 3 |
Publication | Filing date | Title |
---|---|---|
WO02065545A2 | Overlay alignment metrology using diffraction gratings | |
US6677602B1 | Notch and flat sensor for wafer alignment | |
WO0215238A2 | Device and method for optical inspection of semiconductor wafer | |
AU7924701A | Database interpolation method for optical measurement of diffractive microstructures | |
WO0215261A2 | Bathless wafer measurement apparatus and method | |
US6510395B2 | Method of detecting residue on a polished wafer | |
AU4175800A | Method and apparatus for wafer metrology | |
US6690473B1 | Integrated surface metrology | |
US6019000A | In-situ measurement of deposition on reactor chamber members | |
US5996415A | Apparatus and method for characterizing semiconductor wafers during processing |