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NAGASE DENSHI KAGAKU KK

Overview
  • Total Patents
    29
About

NAGASE DENSHI KAGAKU KK has a total of 29 patent applications. Its first patent ever was published in 1987. It filed its patents most often in Japan. Its main competitors in its focus markets optics are THEODOR DITTMANN, LOF JOERI and HOKUBU TSUSHIN KOGYO KK.

Patent filings in countries

World map showing NAGASE DENSHI KAGAKU KKs patent filings in countries
# Country Total Patents
#1 Japan 29

Patent filings per year

Chart showing NAGASE DENSHI KAGAKU KKs patent filings per year from 1900 to 2020

Focus industries

# Industry
#1 Optics

Focus technologies

Top inventors

# Name Total Patents
#1 Kotani Takeshi 20
#2 Nishijima Yoshitaka 18
#3 Shiozu Shinichiro 5
#4 Horiuchi Yoshiaki 5
#5 Takei Mizuki 4
#6 Murata Yoko 3
#7 Saito Yutaka 3
#8 Kitano Kei 3
#9 Ito Kunio 3
#10 Takarayama Takahiro 3

Latest patents

Publication Filing date Title
JP2001209190A Photoresist remover composition and method for using same
JP2001005200A Peeling agent composition for resist and method of using the same
JP2001005199A Peeling agent composition for resist and use method of the same
JP2000330282A Negative radiation sensitive resin composition
JP2000260761A Resist-releasing agent composition and its usage
JP2000250231A Photoresist remover composition and method for using same
JP2000206684A Negative radiation-sensitive resin composition
JP2000171968A Positive photoresist composition
JP2000181083A Resist remover composition and method for using the same
JP2000122309A Resist removing and washing method for semiconductor substrate
JP2000026110A Preparation of stabilized hydroxylamine
JPH11271985A Resist removing agent composition and its use method
JPH11109653A Resist remover composition and method for using same
JPH1184687A Resist removing agent composition and its use method
JPH1152590A Resist remover composition and method for using the same
JPH1114606A Measuring method of aluminum content its aluminum etching solution
JPH1010755A Method for removing na ion from photoresist remover
JPH08146622A Solution for replenishing resist peeling solution and its using method
JPH08137113A Photoresist peeling agent composition
JPH07253678A Photoresist releasing agent composition