| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 11 | |
| #2 | United States | 6 | |
| #3 | WIPO (World Intellectual Property Organization) | 2 | |
| #4 | China | 1 | |
| #5 | EPO (European Patent Office) | 1 | |
| #6 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Semiconductors | |
| #3 | Medical technology | |
| #4 | Organic fine chemistry | |
| #5 | Basic materials chemistry | |
| #6 | Computer technology | |
| #7 | Environmental technology | |
| #8 | Macromolecular chemistry and polymers |
| # | Name | Total Patents |
|---|---|---|
| #1 | Frommhold Andreas | 21 |
| #2 | Robinson Alex Philip Graham | 17 |
| #3 | Yang Dongxu | 14 |
| #4 | Mcclelland Alexandra | 12 |
| #5 | Xue Xiang | 9 |
| #6 | Palmer Richard Edward | 9 |
| #7 | Lada Thomas | 8 |
| #8 | Preece Jon Andrew | 7 |
| #9 | Roth John L | 6 |
| #10 | Athens Drew | 6 |
| Publication | Filing date | Title |
|---|---|---|
| KR20200125662A | Hard mask composition | |
| US2019137876A1 | Multiple trigger monomer containing photoresist compositions and method | |
| US2017345669A1 | Hard-mask composition | |
| KR20180054509A | Sensitivity-enhanced photoresist | |
| US2015140491A1 | Composition of matter and molecular resist made therefrom | |
| US2015241773A1 | Two-step photoresist compositions and methods | |
| US2014255849A1 | Methanofullerenes | |
| US2014134843A1 | Methanofullerenes |