RENA TECH GMBH has a total of 40 patent applications. It increased the IP activity by 33.0%. Its first patent ever was published in 2004. It filed its patents most often in EPO (European Patent Office), Taiwan and Republic of Korea. Its main competitors in its focus markets semiconductors, surface technology and coating and environmental technology are KEIGLER ARTHUR, RENA GMBH and MATSUDA SANGYO CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 8 | |
#2 | Taiwan | 8 | |
#3 | Republic of Korea | 6 | |
#4 | United States | 6 | |
#5 | WIPO (World Intellectual Property Organization) | 6 | |
#6 | China | 3 | |
#7 | Germany | 3 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Surface technology and coating | |
#3 | Environmental technology | |
#4 | Audio-visual technology | |
#5 | Chemical engineering | |
#6 | Medical technology |
# | Name | Total Patents |
---|---|---|
#1 | Uihlein Markus | 20 |
#2 | Burschik John | 12 |
#3 | Pediaditakis Stephan Alexis | 12 |
#4 | Straub Benedikt | 10 |
#5 | Bay Norbert | 8 |
#6 | Kühnlein Holger | 7 |
#7 | Kuehnlein Holger | 7 |
#8 | Duempelfeld Wolfgang | 6 |
#9 | Sander Bernd-Uwe | 6 |
#10 | Hansen Stefan | 6 |
Publication | Filing date | Title |
---|---|---|
TW202012705A | Flow generator, deposition device and method for the deposition of a material | |
TW202004894A | Method for treating objects and apparatus for carrying out the method | |
CN110892518A | Drying apparatus and method for drying substrate | |
CN110383494A | The equipment of the method and implementations this method that be textured to the surface of semiconductor material | |
CN110234799A | Consecutive deposition equipment and component for it | |
DE102017110297A1 | Method and device for treating an object surface by means of a treatment solution | |
KR20170093850A | Device for treating substrates | |
DE102013219839A1 | Device for porosification of a silicon substrate | |
DE102011118441A1 | Plant and method for the treatment of flat substrates |