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QUANXIN INTEGRATED CIRCUIT MFG JINAN CO LTD

Overview
  • Total Patents
    34
  • GoodIP Patent Rank
    45,428
About

QUANXIN INTEGRATED CIRCUIT MFG JINAN CO LTD has a total of 34 patent applications. It filed its patents most often in China. Its main competitors in its focus markets semiconductors, optics and electrical machinery and energy are HONGLI SEMICONDUCTOR MFG CO, WINS KK and ALLIED MATERIAL TECHNOLOGY CORP.

Patent filings in countries

World map showing QUANXIN INTEGRATED CIRCUIT MFG JINAN CO LTDs patent filings in countries
# Country Total Patents
#1 China 34

Top inventors

# Name Total Patents
#1 Cai Qicheng 5
#2 Chen Shangzhi 3
#3 Zeng Shengxiang 3
#4 Yang Mang 3
#5 Huang Desheng 3
#6 Zhang Yujing 3
#7 Liu Zhicheng 3
#8 Wang Jianming 3
#9 He Zunhuo 3
#10 Liu Xuegang 3

Latest patents

Publication Filing date Title
CN112180678A Photomask process error correction method
CN112271151A Machine pollution monitoring device and processing equipment
CN112289679A Ion implantation method, device and equipment
CN112269115A Test structure and test method of semiconductor device
CN112255882A Method for shrinking integrated circuit layout
CN112230514A Overlay error measurement mark structure, manufacturing method thereof and overlay error measurement method
CN112230507A Optical proximity correction model construction method and device and computer equipment
CN112099308A Attenuated phase shift mask and manufacturing method thereof
CN112053986A Adjusting assembly and machine table
CN112051707A Optical proximity effect correction method and device
CN112117184A Residual glue removing method
CN112071901A Electrode connection structure, transistor and preparation method thereof
CN112053981A Anti-scratch wafer box
CN112025547A Laser projection virtual correction device and method
CN112034678A Method and equipment for repairing photomask
CN111863809A Novel trap type resistor structure for fin field effect transistor manufacturing process
CN111830779A Method and system for processing residual defect of phase shift mask and phase shift mask
CN111763929A Method, device and equipment for preparing chemical vapor deposition layer with controlled surface morphology
CN112014710A Needle pressure adapting method and device, needle testing equipment and readable storage medium
CN111913346A Photomask assembly and photoetching system