FOTOCHEM WERKE GMBH has a total of 13 patent applications. Its first patent ever was published in 1983. It filed its patents most often in Germany and German Democratic Republic. Its main competitors in its focus markets optics, electrical machinery and energy and semiconductors are HONGLI SEMICONDUCTOR MFG CO, ALLIED MATERIAL TECHNOLOGY CORP and WINS KK.
# | Country | Total Patents | |
---|---|---|---|
#1 | Germany | 8 | |
#2 | German Democratic Republic | 5 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Electrical machinery and energy | |
#3 | Semiconductors | |
#4 | Basic materials chemistry | |
#5 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Baumbach Wolfgang | 8 |
#2 | Haehnel Elfriede | 5 |
#3 | Mehliss Georg | 5 |
#4 | Siebert Werner | 4 |
#5 | Barnikow Joachim | 4 |
#6 | Lehms Ingeburg | 3 |
#7 | Seibt Horst Dr | 3 |
#8 | Prescher Dietrich Dr | 3 |
#9 | Lehmann Lukas | 3 |
#10 | Ludwig Iris | 3 |
Publication | Filing date | Title |
---|---|---|
DE4128964A1 | Defined adhesive area prodn. esp. for micro-mechanics or integrated sensor - using photoresist adhesive soln. of lacquer, photosensitive cpd. and hardener, etc. | |
DE4040117A1 | Steel sensitive material for electron beam and X-ray lithography and process for dry development of the material | |
DD295723A5 | Plasma-resistant, positively working photo-copy-lacquer | |
DD301109A7 | Method for the continuous production of metallium-free novolakes with largely regulated molecule construction and environmental mol distribution spectrum | |
DD292770A5 | Positive photo copier lacquer with improved surface glaze | |
DD292769A5 | Method for producing microstructures | |
DD266863A1 | Positive photocopying paint |