PROMOS TECHNOLOGY INC has a total of 14 patent applications. Its first patent ever was published in 1998. It filed its patents most often in United States. Its main competitors in its focus markets semiconductors, machines and optics are ASYST TECHNOLOGIES, VLSI TECHNOLOGY RES ASS and SEZ SEMICONDUCT EQUIP ZUBEHOER.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 14 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Machines | |
#3 | Optics | |
#4 | Control | |
#5 | Surface technology and coating | |
#6 | Environmental technology | |
#7 | Machine tools |
# | Name | Total Patents |
---|---|---|
#1 | Tsai Nien-Yu | 2 |
#2 | Lee Ray | 2 |
#3 | Mei Len | 2 |
#4 | Shiao J S | 1 |
#5 | Hsiao Chia-Shun | 1 |
#6 | Jang Chuck | 1 |
#7 | Hung Lin Ming | 1 |
#8 | Chen Brad | 1 |
#9 | Chao Weisheng | 1 |
#10 | Kao Te-Yin | 1 |
Publication | Filing date | Title |
---|---|---|
US7087998B2 | Control of air gap position in a dielectric layer | |
US6495411B1 | Technique to improve deep trench capacitance by increasing surface thereof | |
US6071823A | Deep trench bottle-shaped etch in centura mark II NG | |
US6242137B1 | Method to uni-directionally expand bandwidth of an asymmetric optical system | |
US6211055B1 | Wet-dry-wet process in wet station | |
US6232171B1 | Technique of bottle-shaped deep trench formation | |
US6179915B1 | On track coater unit cup set | |
US6214713B1 | Two step cap nitride deposition for forming gate electrodes | |
US6146260A | Polishing machine |