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PROMERUS LLC

Overview
  • Total Patents
    368
  • GoodIP Patent Rank
    9,052
  • Filing trend
    ⇧ 114.0%
About

PROMERUS LLC has a total of 368 patent applications. It increased the IP activity by 114.0%. Its first patent ever was published in 1998. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Republic of Korea. Its main competitors in its focus markets macromolecular chemistry and polymers, optics and semiconductors are JSR CORP, SHINETSU CHEMICAL CO and AZ ELECTRONIC MATERIALS LUXEMBOURG S À R L.

Patent filings per year

Chart showing PROMERUS LLCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Rhodes Larry F 159
#2 Bell Andrew 133
#3 Kandanarachchi Pramod 67
#4 Elce Edmund 59
#5 Knapp Brian 58
#6 Zhang Wei 54
#7 Ng Hendra 52
#8 Seto Keitaro 37
#9 Burtovyy Oleksandr 35
#10 Shick Robert 29

Latest patents

Publication Filing date Title
US2021079156A1 Two component mass polymerizable compositions containing polycycloolefin monomers and organoruthenium carbide precatalyst
US2021079133A1 Single component mass polymerizable compositions containing polycycloolefin monomers and organoruthenium carbide precatalyst
US2021024685A1 Stable polycycloolefin polymer and inorganic nanoparticle compositions as optical materials
TW202100575A Fast photocurable polycycloolefin compositions as optical or 3d printing materials
US2020363722A1 Positive tone photosensitive compositions containing amic acid as latent base catalyst
WO2020181020A1 Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof
WO2020181022A1 Unsaturated cyclic anhydride end capped polyimides and polyamic acids and photosensitive compositions thereof
WO2020181021A1 Photosensitive polyimide compositions
TW202033682A High impact strength 3d printing materials derived from polycycloolefin monomers and crosslinkers
US2021116807A1 Photosensitive compositions and applications thereof
WO2021076131A1 Photosensitive compositions and applications thereof
US2019339617A1 Permanent dielectric compositions containing photoacid generator and base
US2020017799A1 Fragrance compositions containing norbornene derivatives
TW202000722A Polycycloolefin monomers and catalyst activated by compound capable of generating photoacid as 3D printing materials
TW201946689A High separation performance polydialkylsiloxane pervaporation membranes
TW201932532A Polycycloolefin monomers and catalyst activated by compound capable of generating photoacid as optical materials
TW201917146A High glass transition temperature polycarbonates derived from adamantane epoxides
TW201910362A Polycycloolefin polymer composition as optical material
TW201902959A Photosensitive composition, color filter, and microlens derived therefrom
TW201835129A Photoalignment film forming composition and lcd devices derived therefrom