Learn more

SHINETSU CHEMICAL CO

Overview
  • Total Patents
    34,682
  • GoodIP Patent Rank
    158
  • Filing trend
    ⇧ 1.0%
About

SHINETSU CHEMICAL CO has a total of 34,682 patent applications. It increased the IP activity by 1.0%. Its first patent ever was published in 1959. It filed its patents most often in Japan, United States and EPO (European Patent Office). Its main competitors in its focus markets macromolecular chemistry and polymers, optics and semiconductors are SHIN-ETSU CHEMICAL CO LTD, JSR CORP and PROMERUS LLC.

Patent filings per year

Chart showing SHINETSU CHEMICAL COs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hatakeyama Jun 1,883
#2 Shiobara Toshio 914
#3 Hasegawa Koji 766
#4 Minowa Takehisa 649
#5 Kubota Yoshihiro 615
#6 Kinsho Takeshi 612
#7 Ohashi Masaki 563
#8 Ogihara Tsutomu 543
#9 Amano Tadashi 541
#10 Shimizu Toshihide 529

Latest patents

Publication Filing date Title
EP3815681A1 Capsule filling composition, method of producing capsule formulation with the use of capsule filling composition, and capsule formulation
EP3816192A1 Hydroxypropyl methyl cellulose acetate succinate and method for producing the same
EP3816191A1 Hydroxypropyl methyl cellulose phthalate and method for producing the same
EP3815530A1 Method for controlling beet armyworm
WO2021075457A1 Resin-coated metal powder, method for producing same and aqueous coating composition using same
EP3808727A1 Processes for preparing a 2-(1,2,2-trimethyl-3-cyclopentenyl)-2-oxoethyl carboxylate compound and hydroxymethyl 1,2,2-trimethyl-3-cyclopentenyl ketone, and a halomethyl (1,2,2-trimethyl-3-cyclopentenyl) ketone compound
US2021116808A1 Positive resist composition and patterning process
WO2021079714A1 Thermally conductive silicone composition and production method therefor
WO2021065852A1 Titanium oxide particles, dispersion of titanium oxide particles, and method for producing dispersion of titanium oxide particles
WO2021079679A1 Photosensitive resin composition, photosensitive dry film, and pattern formation method
US2021095079A1 Polysiloxazane compound having alkoxysilyl group, process for producing same, and composition and cured product including same
JP2020201517A Pellicle frame, and pellicle
WO2021065547A1 Wafer processed body, temporary adhesive for wafer processing, and method for manufacturing thin wafer
WO2021065527A1 Fluorine-containing curable composition and article
WO2021065537A1 Coating agent composition, surface treatment method and article
US2021096465A1 Polymer, chemically amplified resist composition and patterning process
US2021096455A1 Halftone phase shift-type photomask blank, method of manufacturing thereof, and halftone phase shift-type photomask
WO2021075182A1 Water-dispersed emulsion composition, method for producing same, emulsion addition-cured composition, and cosmetic preparation
WO2021070534A1 Primer composition for silicone adhesive
WO2021059936A1 Thermally conductive silicone composition, production method thereof, and semiconductor device