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ADVANCED MICRO OPTICS INSTR INC

Overview
  • Total Patents
    15
  • GoodIP Patent Rank
    110,086
About

ADVANCED MICRO OPTICS INSTR INC has a total of 15 patent applications. Its first patent ever was published in 2018. It filed its patents most often in China. Its main competitors in its focus markets optics and computer technology are SHANGHAI DONGSHEN ELECTRONIC TECHNOLOGY CO LTD, KONSTANTINOV and DAINIPPON KAKEN KK.

Patent filings in countries

World map showing ADVANCED MICRO OPTICS INSTR INCs patent filings in countries
# Country Total Patents
#1 China 15

Patent filings per year

Chart showing ADVANCED MICRO OPTICS INSTR INCs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Zhang Lei 14
#2 Li Weicheng 8
#3 Zhang Ke 5
#4 Liu Dong 3
#5 Qian Zhibin 1
#6 Hu Chuanwu 1
#7 Liao Shaoliang 1
#8 Xu Taopeng 1
#9 Liu Jinwu 1

Latest patents

Publication Filing date Title
CN112200886A Filling method of vector graphics
CN111999990A Exposure method and exposure system
CN111781802A Illumination device and exposure system
CN111273522A Exposure method and processing method of substrate
CN111290222A Method for processing ink layer
CN111273525A Exposure machine applied to inner-layer plate and real-time monitoring method of alignment system
CN111273521A Automatic material loading and unloading single-table-board double-station exposure machine
CN111273519A Exposure lens energy calibration method and calibration device thereof
CN111221224A Calibration ruler and position calibration method using same
CN110187608A A kind of exposure method of write-through exposure machine
CN110187607A A kind of direct-write photoetching mechanism and its exposure method
CN109471337A A kind of exposure machine and alignment exposure method for the exposure of PCB inner plating
CN109343314A A kind of exposure device for double-sided flexible circuit board
CN109254503A A kind of LED projection illumination photolithographic imaging system
CN109031899A A kind of high-resolution high efficiency projecting etching imaging system and exposure method