NITTA HAAS INC has a total of 455 patent applications. It decreased the IP activity by 21.0%. Its first patent ever was published in 2003. It filed its patents most often in Japan, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets basic materials chemistry, semiconductors and machine tools are CABOT MICROELECTRONICS CORP, ROHM & HAAS ELECT MAT CMP HOLDINGS INC and NITTA DUPONT INCORPORATED.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 225 | |
#2 | Taiwan | 59 | |
#3 | WIPO (World Intellectual Property Organization) | 56 | |
#4 | China | 37 | |
#5 | Republic of Korea | 34 | |
#6 | United States | 18 | |
#7 | Singapore | 14 | |
#8 | EPO (European Patent Office) | 5 | |
#9 | Malaysia | 4 | |
#10 | Germany | 3 |
# | Industry | |
---|---|---|
#1 | Basic materials chemistry | |
#2 | Semiconductors | |
#3 | Machine tools | |
#4 | Surface technology and coating | |
#5 | Machines | |
#6 | Audio-visual technology | |
#7 | Macromolecular chemistry and polymers |
# | Name | Total Patents |
---|---|---|
#1 | Matsushita Takayuki | 69 |
#2 | Sugita Noriaki | 62 |
#3 | Haba Shinichi | 44 |
#4 | Morioka Yoshitaka | 35 |
#5 | Teramoto Masashi | 33 |
#6 | Nitta Hiroshi | 31 |
#7 | Yoshida Koichi | 29 |
#8 | Itai Yasuyuki | 29 |
#9 | Kawabata Katsumasa | 26 |
#10 | Shigeta Yoshitane | 26 |
Publication | Filing date | Title |
---|---|---|
WO2020027260A1 | Polishing composition | |
WO2019176558A1 | Polishing composition | |
JP2019127585A | Polishing composition | |
TW201940561A | Polishing pad | |
WO2019131885A1 | Slurry for polishing | |
JP2019119854A | Polishing composition | |
JP2020019863A | Slurry for polishing | |
JP2019131641A | Polishing composition | |
JP2019126900A | Polishing pad | |
JP2019127511A | Polishing composition | |
JP2019123031A | Polishing pad | |
JP2019117904A | Polishing composition | |
CN110050053A | Composition for polishing and grinding method | |
CN110036086A | Composition for polishing | |
JP2019117907A | Polishing composition | |
JP2019115971A | Polishing pad | |
WO2018124226A1 | Polishing composition, and polishing method | |
JP2019116528A | Polishing composition | |
JP2019116529A | Polishing composition, and method for adjusting polishing rate | |
JP2018104690A | Polishing composition |