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ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC

Overview
  • Total Patents
    473
  • GoodIP Patent Rank
    3,515
  • Filing trend
    ⇧ 12.0%
About

ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC has a total of 473 patent applications. It increased the IP activity by 12.0%. Its first patent ever was published in 2004. It filed its patents most often in United States, Taiwan and Republic of Korea. Its main competitors in its focus markets machine tools, basic materials chemistry and semiconductors are ROHM & HAAS ELECTRONIC MAT CMP HOLDINGS INC, ROHM & HAAS ELECT MAT CMP HOLDINGS INC and SCHWANDNER JUERGEN.

Patent filings per year

Chart showing ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Qian Bainian 76
#2 Jacob George C 71
#3 Hendron Jeffrey James 63
#4 Guo Yi 54
#5 Stack Jeffrey Robert 47
#6 Ho Lin-Chen 39
#7 Tran Tony Quan 38
#8 Mosley David 36
#9 Penta Naresh Kumar 34
#10 Tsai Wei-Wen 34

Latest patents

Publication Filing date Title
US2020239737A1 Chemical mechanical polishing compositions having stabilized abrasive particles for polisihng dielectric substrates
US2021071034A1 Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films.
US2020384602A1 Fluopolymer composite cmp polishing method
US2020384600A1 Thin film fluopolymer composite cmp polishing method
US2020384605A1 Cationic fluoropolymer composite polishing method
US2020384601A1 Thin film fluoropolymer composite cmp polishing pad
US2020384604A1 Cationic fluoropolymer composite polishing pad
US2020384603A1 Low-debris fluopolymer composite cmp polishing pad
US10787592B1 Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment
US2020362198A1 Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide
US2020308445A1 Chemical mechanical polishing method for cobalt with high cobalt removal rates and reduced cobalt corrosion
US10626298B1 Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon
US2019338163A1 Chemical mechanical polishing method for tungsten
US10604678B1 Chemical mechanical polishing of tungsten using a method and composition containing quaternary phosphonium compounds
US2020239734A1 Acid polishing composition and method of polishing a substrate having enhanced defect inhibition
US2019232459A1 Polishing pad with multipurpose composite window
US2019224811A1 Polishing pad with pad wear indicator
US10569384B1 Chemical mechanical polishing pad and polishing method
US10464188B1 Chemical mechanical polishing pad and polishing method
US10597558B1 Chemical mechanical polishing composition and method for tungsten