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N & K TECHNOLOGY INC

Overview
  • Total Patents
    46
About

N & K TECHNOLOGY INC has a total of 46 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets measurement, optics and semiconductors are TAIWAN POWER TESTING TECHNOLOGY CO LTD, OTSUKA ELECTRONICS CO LTD and TEMET INSTR OY.

Patent filings per year

Chart showing N & K TECHNOLOGY INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Forouhi Abdul Rahim 25
#2 Li Guoguang 18
#3 Buermann Dale 12
#4 Mandella Michael J 9
#5 Harrison Dale A 7
#6 Aho Marc 6
#7 Chen Shuqiang 6
#8 Walsh Phillip 5
#9 Tran Daniel 4
#10 Wilson Thaddeus J 3

Latest patents

Publication Filing date Title
US7999936B1 Combined transmittance and angle selective scattering measurement of fluid suspended particles for simultaneous determination of refractive index, extinction coefficient, particle size and particle density
US7679736B1 System and method for optical photomask inspection through pellicle
US7962242B1 Automated spatial flipping apparatus and system for photomasks and photomasks with pellicles
US7756677B1 Implementation of rigorous coupled wave analysis having improved efficiency for characterization
US7755775B1 Broadband optical metrology with reduced wave front distortion, chromatic dispersion compensation and monitoring
US7397030B1 Integrated local and global optical metrology for samples having miniature features
US7505147B1 Efficient calculation of grating matrix elements for 2-D diffraction
US7717661B1 Compact multiple diameters wafer handling system with on-chuck wafer calibration and integrated cassette-chuck transfer
US7397554B1 Apparatus and method for examining a disk-shaped sample on an X-Y-theta stage
US7525672B1 Efficient characterization of symmetrically illuminated symmetric 2-D gratings
US7349103B1 System and method for high intensity small spot optical metrology
US7330256B1 Spectrophotometric system with reduced angle of incidence
US7289214B1 System and method for measuring overlay alignment using diffraction gratings
US7391524B1 System and method for efficient characterization of diffracting structures with incident plane parallel to grating lines
US2006018748A1 Photomask flipper and single direction inspection device for dual side photomask inspection
US7212293B1 Optical determination of pattern feature parameters using a scalar model having effective optical properties
US2006017915A1 Disc clamping device for multiple standard discs
US7248364B2 Apparatus and method for optical characterization of a sample over a broadband of wavelengths with a small spot size
US7327457B2 Apparatus and method for optical characterization of a sample over a broadband of wavelengths while minimizing polarization changes
US7044476B2 Compact pinlifter assembly integrated in wafer chuck