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MOORE EPITAXIAL INC

Overview
  • Total Patents
    49
About

MOORE EPITAXIAL INC has a total of 49 patent applications. Its first patent ever was published in 1989. It filed its patents most often in United States, EPO (European Patent Office) and Japan. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are AIXTRON AG, HAN VAC CO LTD and BLOMILEY ERIC R.

Patent filings in countries

World map showing MOORE EPITAXIAL INCs patent filings in countries

Patent filings per year

Chart showing MOORE EPITAXIAL INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Moore Gary M 42
#2 Nishikawa Katsuhito 26
#3 Carlos Thomas F 3
#4 Pairish Richard S 3
#5 Peterson Michael 2
#6 Beese Steven C 2
#7 Inoue Kazutoshi 2
#8 Ingles Aaron David 2
#9 Inlges Aaron David 1
#10 Curran William J 1

Latest patents

Publication Filing date Title
US2007087533A1 Gas ring and method of processing substrates
US2003029384A1 Rotating susceptor
EP1123992A2 Semiconductor processing apparatus and method
US6428609B1 Exhaust particulate controller and method
US6491435B1 Linear robot
US6443618B1 Particulate free air bearing and seal
US6328221B1 Method for controlling a gas injector in a semiconductor processing reactor
US6347749B1 Semiconductor processing reactor controllable gas jet assembly
US6475284B1 Gas dispersion head
US6799603B1 Gas flow controller system
US6163015A Substrate support element
US6169244B1 Thermocouple sheath cover
US6213478B1 Holding mechanism for a susceptor in a substrate processing reactor
US6110289A Rapid thermal processing barrel reactor for processing substrates
US5801961A Power management system for a semiconductor processing facility
US5802099A Method for measuring substrate temperature in radiant heated reactors
US5820686A Multi-layer susceptor for rapid thermal process reactors
US5872632A Cluster tool layer thickness measurement apparatus
US5580388A Multi-layer susceptor for rapid thermal process reactors
US5444217A Rapid thermal processing apparatus for processing semiconductor wafers