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HAN VAC CO LTD

Overview
  • Total Patents
    16
About

HAN VAC CO LTD has a total of 16 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Republic of Korea and Taiwan. Its main competitors in its focus markets surface technology and coating, semiconductors and environmental technology are BUTCHER KENNETH SCOTT ALEXANDER, AIXTRON AG and BLOMILEY ERIC R.

Patent filings in countries

World map showing HAN VAC CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 15
#2 Taiwan 1

Patent filings per year

Chart showing HAN VAC CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Son Jae Il 6
#2 Huh Yun Seong 6
#3 Park Geun Seop 6
#4 Oh Se Hu 2
#5 Jung Won Ho 2
#6 Lee Geum Ok 2
#7 Cho Saeng Hyeon 2
#8 Nam Seung Jae 2
#9 Kim Chan Jung 1
#10 Hwang Nong Mun 1

Latest patents

Publication Filing date Title
KR20030078203A Gas shower of reactor for metal organic chemical vapor deposition system
KR20030052267A Apparatus for temperature stabilization of the substrate for a semiconductor or flat panel display
KR20030048750A Sputter gun of sputtering system for film deposition
KR20030047574A Method and apparatus of manufacturing polycrystalline silicon thin film
KR20030042484A Low Temperature Poly-Si Crystalizing Apparatus for Flat display
KR20030012139A Tabbing apparatus for a solar cell module
KR20030010127A Laminator structure for a solar cell module
KR20020088091A Horizontal reactor for compound semiconductor growth
KR20020000898A Nitride compound semiconductor device and method of fabricating the same
KR20000049494A Horizontal Reactor for Compound Semiconductor Growth having a Gas Guiding Member
KR20010078653A The in-situ magnetization apparatus of a magnetic-material thin film manufactured by physical vapor deposition method
KR20010027218A Device for automatically supplying specimen of vacuum evaporator
KR100271831B1 Horizontal reactor for compound semiconductor growth
KR20000021960A Mixed target carrousel assembly for laser vacuum absorption
KR100297573B1 Reaction furnace for fabricating the third to the fifth group compound semiconductor