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US4723086A
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Coarse and fine motion positioning mechanism
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Process for making a mask used in x-ray photolithography
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Multiple wavelength linear zone plate alignment apparatus and method
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X-ray mask membrane deflection compensator and method
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Mask using polyimide to support a patterned x-ray opaque layer
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Method for producing a mask for use in X-ray photolithography and resulting structure
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Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure
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Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask
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Process for making a mask used in x-ray photolithography
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Gas control for X-ray lithographic system
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