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LEETECH CO LTD

Overview
  • Total Patents
    35
  • GoodIP Patent Rank
    54,580
  • Filing trend
    ⇩ 42.0%
About

LEETECH CO LTD has a total of 35 patent applications. It decreased the IP activity by 42.0%. Its first patent ever was published in 2011. It filed its patents most often in Republic of Korea. Its main competitors in its focus markets optics, audio-visual technology and surface technology and coating are ADTEC ENG KK, OPTIRAY CO KR and SANEI GIKEN CO LTD.

Patent filings in countries

World map showing LEETECH CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 35

Patent filings per year

Chart showing LEETECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Hyung Ku 19
#2 Lee Soo Jin 16
#3 Park Jing Seo 9
#4 Lee Hyung Kyu 9
#5 Park Sun Jae 6
#6 Baek Seung Yeol 5
#7 Lee Hyungku 5
#8 Heo Jae Kook 5
#9 Lee Soojin 5
#10 Byun Young Hee 3

Latest patents

Publication Filing date Title
KR20190036511A Apparatus for aligning dmd of exposure optics and method thereof
KR20200059689A Method for compensating heat deformation error according to operating of stage
KR102074678B1 Trepanning module
KR20200035661A System for preventing scatter contamination
KR20200020145A Laminating system
KR20190061144A Trepanning module
KR20190060173A Laser optical system
KR20190036022A Apparatus for aligning dmd of exposure optics and method thereof
KR20190035066A Exposure apparatus based on dmd capable high speed exposure and low speed exposure
KR20190032015A Exposure optics for adjusting direction of irradiating light incident on digital micromirror device and light illumination optics thereof
KR20190004569A Vacuum laminator and method for vacuum laminating
KR20190004568A Apparatus for planarizing surfae of substrate using displacement sensor and method thereof
KR20180058289A Methods of bonding needles to coaxial cables
KR20180012522A Exposure optics for irradiating light perpendicularly incident on digital micromirror device
KR20180012471A Alignment method of working stage and dmd in dmd exposure optical system
KR101720595B1 Method and apparatus for producing raster image useable in exposure apparatus based on dmd and recording medium for recording program for executing the method
KR20170082783A Manufacturing apparatus and manufacturing method for flexible printed circuit board
KR20170082927A Laminating device and method of laminating object
KR20170042991A Reaction Force Compensator for High Precision Stage
KR101689836B1 Digital mirror device overheat reduction system using pulse controll of high power uv led