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NICHIGO MORTON CO LTD

Overview
  • Total Patents
    169
  • GoodIP Patent Rank
    227,703
About

NICHIGO MORTON CO LTD has a total of 169 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Japan, China and Taiwan. Its main competitors in its focus markets optics, machines and audio-visual technology are ADTEC ENG KK, MACDERMID PRINTING SOLUTIONS LLC and LEETECH CO LTD.

Patent filings per year

Chart showing NICHIGO MORTON CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lundy Daniel E 50
#2 Barr Robert 39
#3 Murakami Shigeru 35
#4 Iwata Kazutoshi 32
#5 Kosaka Eiji 25
#6 Yasumoto Ryoichi 22
#7 Hiuga Atsuyoshi 22
#8 Takamiya Hiroyuki 14
#9 Hamada Yasuhiro 14
#10 Barr Robert K 11

Latest patents

Publication Filing date Title
JP2014017309A Film-like resin lamination device
WO2012118031A1 Photosensitive resin composition, photoresist film using same, resist pattern forming method, and conductor pattern forming method
JP2013114008A Photosensitive resin composition, and photoresist film using the same
WO2011129186A1 Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board
JP2012040812A Stacking apparatus
JP2010170092A Photosensitive resin composition and photoresist film using the same
JP2009166487A Flat pressing machine, laminating apparatus and laminating method using them
TW200908839A Solder mask, photoresist pattern forming method and the light-emitting device thereof
JP2008221840A Film-like resin laminating apparatus and film-like resin laminating method using the same
WO2007142290A1 Laminating apparatus and method of laminating therewith
JP2008012918A Laminating apparatus, and laminating method using it
JP2008209502A Photosensitive resin composition and photosensitive resin laminate using the same
JP2007241257A Photosensitive resin composition and photoresist film using the same
CN101379434A Photosensitive resin composition and photoresist film using the same
JP2008166313A Method for forming resist pattern
JP2008170463A Photosensitive resin composition, and photosensitive resin laminate and resist dry film using the same
JP2008119898A Film-shaped resin lamination apparatus and film-shaped resin lamination method using the apparatus
JP2007114234A Photosensitive resin composition and photosensitive dry film resist
JP2006276482A Photosensitive resin composition and photosensitive dry film resist using the same
JP2006220803A Photosensitive resin composition and photosensitive resin laminate using it