| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 72 | |
| #2 | Taiwan | 44 | |
| #3 | China | 31 | |
| #4 | United States | 18 | |
| #5 | EPO (European Patent Office) | 7 | |
| #6 | WIPO (World Intellectual Property Organization) | 7 | |
| #7 | United Kingdom | 4 | |
| #8 | Germany | 2 | |
| #9 | Hong Kong | 1 | |
| #10 | Singapore | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Audio-visual technology | |
| #3 | Semiconductors | |
| #4 | Measurement | |
| #5 | Packaging and shipping | |
| #6 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Nakagawa Wataru | 19 |
| #2 | Nagoya Jun | 16 |
| #3 | Imai Hiroyuki | 15 |
| #4 | Momose Katsumi | 12 |
| #5 | Asami Masatoshi | 11 |
| #6 | Ida Ryoichi | 11 |
| #7 | Sangu Katsuya | 11 |
| #8 | Kikuchi Hiroaki | 9 |
| #9 | Mizutani Gunji | 8 |
| #10 | Matsumoto Noriyoshi | 8 |
| Publication | Filing date | Title |
|---|---|---|
| TW200300524A | Optical magnification adjustment system and projection exposure device | |
| US6252649B1 | Aligner | |
| KR100216240B1 | Circuit pattern inspection apparatus and method | |
| GB9319933D0 | Method for alignment employing film mask and aligner therefor | |
| US5257067A | Apparatus for placing film mask in contact with object |