| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Taiwan | 25 | |
| #2 | Republic of Korea | 21 | |
| #3 | China | 9 | |
| #4 | EPO (European Patent Office) | 9 | |
| #5 | United States | 8 | |
| #6 | WIPO (World Intellectual Property Organization) | 8 | |
| #7 | Germany | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Audio-visual technology | |
| #3 | Surface technology and coating | |
| #4 | Semiconductors | |
| #5 | Mechanical elements | |
| #6 | Machine tools | |
| #7 | Machines |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Casings and printed circuits | |
| #3 | Layered products | |
| #4 | Semiconductor devices | |
| #5 | Presses | |
| #6 | Unspecified technologies | |
| #7 | Shafts | |
| #8 | Nonlinear optics | |
| #9 | Venting or aerating devices | |
| #10 | Cameras |
| # | Name | Total Patents |
|---|---|---|
| #1 | Miyake Ken | 40 |
| #2 | Miyake Eiichi | 36 |
| #3 | Takagi Toshihiro | 26 |
| #4 | Ken Miyake | 6 |
| #5 | Toshihiro Takagi | 4 |
| #6 | Hashimoto Hironobu | 3 |
| #7 | Imanishi Ken | 2 |
| #8 | Hironobu Hashimoto | 1 |
| #9 | Eiichi Miake | 1 |
| #10 | Kobayashi Kazuhiro | 1 |
| Publication | Filing date | Title |
|---|---|---|
| WO2008139643A1 | Exposure method and exposure apparatus | |
| KR20080023350A | Exposing method and device | |
| TW200422165A | Laminating press device, vacuum laminating device, and vacuum laminating method | |
| TW200400783A | Exposure method and exposure apparatus | |
| TW200307184A | Scan exposure method and scan exposure apparatus | |
| WO0116654A1 | Substrate supporting table of exposure system | |
| US6320659B1 | Clearance measuring device and method for exposure | |
| EP1249340A1 | Laminator | |
| EP1238799A1 | Laminator | |
| TW390956B | Positioning mark and alignment method using the same | |
| TW359770B | Photomask and alignment method |