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LAMBDA PHYSIK AG

Overview
  • Total Patents
    200
About

LAMBDA PHYSIK AG has a total of 200 patent applications. Its first patent ever was published in 1988. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Germany. Its main competitors in its focus markets optics, measurement and machine tools are CYMER LASER TECH, QUINTESSENCE PHOTONICS CORP and LAMBDA PHYSIK GMBH.

Patent filings in countries

World map showing LAMBDA PHYSIK AGs patent filings in countries

Patent filings per year

Chart showing LAMBDA PHYSIK AGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Stamm Uwe 55
#2 Kleinschmidt Juergen 49
#3 Govorkov Sergei V 34
#4 Bragin Igor 28
#5 Vogler Klaus Wolfgang 22
#6 Rebhan Ulrich 19
#7 Heist Peter 19
#8 Voss Frank 17
#9 Zschocke Wolfgang 16
#10 Albrecht Hans-Stephan 16

Latest patents

Publication Filing date Title
US2006171439A1 Master oscillator—power amplifier excimer laser system
US7184204B2 Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
US7366213B2 MOPA excimer or molecular fluorine laser system with improved synchronization
US7164703B2 Temperature control systems for excimer lasers
US6987790B2 Excimer or molecular fluorine laser with several discharge chambers
US7158553B2 Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
US7079565B2 Systems and methods utilizing laser discharge electrodes with ceramic spoilers
US6999492B2 Reduced-maintenance excimer laser with oil-free solid state pulser
US7308013B2 Excimer or molecular fluorine laser system with precision timing
WO2004013940A2 Gas discharge laser
US6993052B2 System and method for delay compensation for a pulsed laser
US6970492B2 DUV and VUV laser with on-line pulse energy monitor
WO03067721A2 Solid-state diode pumped laser employing oscillator-amplifier
US2003210715A1 Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US2004252740A1 Laser gas replenishment method
US2003161374A1 High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
US6700916B1 E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source systems
US6839375B1 On-line quality control of the key optical components in lithography lasers using laser induced fluorescence
US2003058429A1 Stable energy detector for extreme ultraviolet radiation detection
US6690703B1 Molecular fluorine laser system