| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Japan | 11 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Semiconductors | |
| #3 | Optics |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Semiconductor devices | |
| #3 | Nonlinear optics |
| # | Name | Total Patents |
|---|---|---|
| #1 | Kubota Naoki | 6 |
| #2 | Inoue Yoshihisa | 3 |
| #3 | Minowa Hiroyuki | 2 |
| #4 | Ikegami Kaoru | 2 |
| #5 | Yoshimura Toshiaki | 2 |
| #6 | Ogawa Yoshiaki | 2 |
| #7 | Morii Mitsuru | 1 |
| #8 | Funakubo Hiroshi | 1 |
| #9 | Tonari Kazuaki | 1 |
| #10 | Takamatsu Yukichi | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JP2006295020A | Apparatus and method for forming oxide film | |
| JP2005252042A | Substrate holding device | |
| JP2004259905A | Reactor for vapor growth deposition | |
| JP2004027306A | Ion beam sputtering apparatus | |
| JP2002134474A | Plasma treatment device | |
| JP2002124510A | Plasma etching equipment | |
| JP2002124399A | Plasma generation device | |
| JP2002124509A | Etching equipment | |
| JP2002121687A | Plasma treating system | |
| JPH118204A | High speed lamp-heating processor | |
| JPH08218186A | Vapor phase etching device and vapor phase etching method |