KOELMEL BLAKE has a total of 12 patent applications. Its first patent ever was published in 2007. It filed its patents most often in United States. Its main competitors in its focus markets semiconductors, surface technology and coating and thermal processes are CNI TECH, CANON SALES CO INC and OTSUKA MANABU.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 12 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Surface technology and coating | |
#3 | Thermal processes | |
#4 | Electrical machinery and energy | |
#5 | Measurement |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Coating metallic material | |
#3 | Details of furnaces | |
#4 | Measuring light | |
#5 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Koelmel Blake | 12 |
#2 | Ranish Joseph M | 7 |
#3 | Mayur Abhilash J | 6 |
#4 | Lerner Alexander N | 6 |
#5 | Sorabji Khurshed | 3 |
#6 | Sangam Kedarnath | 3 |
#7 | Ma Kai | 3 |
#8 | Myo Nyi O | 1 |
#9 | Sanchez Errol C | 1 |
Publication | Filing date | Title |
---|---|---|
US2012213500A1 | Edge ring for a thermal processing chamber | |
US2012304928A1 | Apparatus and methods for positioning a substrate using capacitive sensors | |
US2012309115A1 | Apparatus and methods for supporting and controlling a substrate | |
US2008280453A1 | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber | |
US2009181553A1 | Apparatus and method of aligning and positioning a cold substrate on a hot surface | |
US2008276864A1 | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |