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IRUJA CO LTD

Overview
  • Total Patents
    31
  • GoodIP Patent Rank
    116,124
  • Filing trend
    ⇩ 100.0%
About

IRUJA CO LTD has a total of 31 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2008. It filed its patents most often in Republic of Korea and China. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are ULVAC CO LTD, ULTECH CO LTD and NAGASHIMA MAKOTO.

Patent filings in countries

World map showing IRUJA CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 30
#2 China 1

Patent filings per year

Chart showing IRUJA CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Won Yong 12
#2 Yoo Hwan Kyu 10
#3 Park Young Teak 10
#4 Ko Kwang Soo 7
#5 Choi Jae Moon 6
#6 Han Gi Youl 5
#7 Han Ki In 5
#8 Choi Jueng Hwan 4
#9 Huh Yun Sung 4
#10 Nam Chang Woo 4

Latest patents

Publication Filing date Title
KR20190005628A Sputtering device including magnetic flux block
KR20170124779A Double Tube Bellows
KR20170107623A Platen and Sputtering Apparatus having the Same
KR20170060630A Clamp short detection device of film forming apparatus
KR20170029061A sputter Shield Module for Sputtering Apparatus
KR20170020643A Sputtering device capable of adjust tilting angle of target
KR20160132246A Sputtering Device Controlling residual stress of substrate
KR20160062805A Sputtering Device Controlling residual stress of thin film
KR101608946B1 Mask Shield Module and Sputtering Apparatus having the Same
KR20160056343A Vacuum Film Coating Apparatus
KR20140138048A Sputtering Device having split type magnet
KR20150129195A Loading chamber in thin film depositing apparatus and method for removing dust using the same
KR20150108656A System of processing substrate
KR20150108657A Apparatus of treating substrate, method of operating the same, and method of manufacturing substrate using the same
KR20150061464A Sputtering Apparatus having Electrostatic Chuck
KR20140136112A Rotatable Target and Process Chamber having the Same
KR20140117890A Apparatus of treating substrate, and methods of manufacturing substrate for electronic device and flat display device using the same
KR20140106925A Apparatus of treating substrate, and methods of manufacturing substrate for electronic device and flat display device using the same
KR101421637B1 Apparatus for Recycling Non-active gas in Sputter
KR20130114778A Non-magnetron sputtering apparatus